Opis: Plasma Electronics - Zoran Lj. Petrovic, Toshiaki Makabe

Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations. "This text serves both the expert and the newcomer with background and state-of-the-art knowledge of plasma electronics. It should be on the bookshelf of anyone exploiting plasma technology for device fabrication. Clearly written and well illustrated, it is also suitable as a postgraduate teaching text and, having been updated, may be a standard reference for the next decade." -Nigel J. Mason, Professor, Department of Physical Sciences, The Open University "This book is a unique and invaluable source of insight and clarity with special strengths in treating charged particle-neutral collisions, rigorously generalized with proper kinetic theory. This rigor in analyzing discharge physics fundamentals makes the subsequent treatment of plasma modeling and surface modification applications in microelectronics even more valuable. It will no doubt become a standard reference for all scientists and engineers interested in weakly ionized, non-equilibrium plasmas." -David B. Graves, Professor and Lam Research Distinguished Chair, Department of Chemical and Biomolecular Engineering, University of California, Berkeley "... unique in the low-temperature plasma literature for the breadth of its aims and wide-ranging scope, and I would strongly recommend as a reference for postgraduate students in the field." -Robert E. Robson, Professor, James Cook University "This book discusses the fundamental principles of partially ionized, chemically reactive plasma discharges and their use in thin film processing ... a well-written book for plasma engineers and scientists. ... [they] will benefit a lot from this book ..." -Hong-Young Chang, Professor, Korean Advanced Institute of Science and Technology (KAIST) "A unique textbook written by two of the most outstanding scientists in the field ... A very valuable part of the book is devoted to modeling and numerical simulation ... an indispensable source of knowledge and an excellent reference for all kinds of basic phenomena." -Uwe Czarnetzki, Professor and Chair, Faculty of Physics and Astronomy, Ruhr-Universitat Bochum "The book offers a truly excellent account on the fundamental physics of low-temperature plasmas and applications of low-temperature plasmas to other scientific disciplines and technologies. I strongly recommend this book to both newcomers as a high-standard introductory textbook and experts as a comprehensive reference." -Satoshi Hamaguchi, Professor, Center for Atomic and Molecular Technologies, Osaka UniversityIntroduction Plasma and Its Classification Application of Low Temperature Plasma Academic Fusion References Phenomenological Description of the Charged Particle Transport Transport in Real (Configuration) Space Momentum Balance of Electrons Energy Balance of Electrons Transport in Velocity Space Electron Velocity Distribution and Swarm Parameters Ion Velocity Distribution and Mean Energy Thermal Equilibrium and its Governing Relations Boltzmann Distribution in Real Space Maxwell Distribution in Velocity Space References Macroscopic Plasma Characteristics Introduction Quasi Neutrality Charge separation In Plasmas Spatial Scale of Charge-Separation Time Scale for Charge-Separation Plasma Shielding Debye Shielding Metal Probe in a Plasma Particle Diffusion Ambipolar Diffusion Spatial and Time Scale of Diffusion Bohm Sheath Criterion Bohm Velocity Floating Potential References Elementary Processes in Gas Phase and on Surfaces Particles and Waves Particle Representation in Classical and Quantum Mechanics Locally Isolated Particle Group and Wave Packets Collisions and Cross Sections Conservation Laws in Collisions Definition of Collision Cross Sections The Distribution of Free Paths Representation of Collisions in Laboratory and CM Reference Frames Classical Collision Theory Scattering in Classical Mechanics Conditions for the Applicability of the Classical Scattering Theory Quantum Theory Of Scattering Differential Scattering Cross Section sigma(theta) Modified Effective Range Theory in Electron Scattering Collisions Between Electrons And Neutral Atoms/Molecules Resonant Scattering Electron-Atom Collisions Energy Levels of Atoms Electron-Atom Scattering Cross Sections Electron-Molecule Collisions Rotational, Vibrational, and Electronic Energy Levels of Molecules Rotational Excitation Rotational Energy Levels Rotational Excitation Cross Sections Vibrational Excitation Vibrational Energy Levels Vibrational Cross Sections Electronic Excitation and Dissociation Electronic States of Molecules Cross Sections for Electronic Excitation of Molecules Electron Collisions with Excited Atoms and Molecules Nonconservative Collisions of Electrons With Atoms and Molecules Electron-Induced Ionization Electron Attachment Dissociative Electron Attachment Nondissociative Electron Attachment Ion Pair Formation Electron Attachment to Excited Molecules Rate Coefficients for Attachment Electron-Ion and Ion-Ion Recombination Electron-Ion and Electron-Electron Collisions Heavy Particle Collisions Ion-Molecule Collisions Charge Transfer, Elastic, and Inelastic Scattering of Ions Ion-Molecule Reactions Collisions of Fast Neutrals Collisions of Excited Particles Chemi-Ionization and Penning Ionization Collisions of Slow Neutrals and Rate Coefficients Quenching and Transport of Excited States Kinetics of Rotational and Vibrational Levels Photons in Ionized Gases Emission and Absorption of Line Radiation Resonant Radiation Trapping Elementary Processes at Surfaces Energy Levels of Electrons in Solids Emission of Electrons from Surfaces Photo-Emission Thermionic Emission Field-Induced Emission Potential Ejection of Electrons from Surfaces by Ions and Excited Atoms Emission of Ions and Neutrals from Surfaces Surface Neutralization Surface Ionization Adsorption References The Boltzmann Equation and Transport Equations of Charged Particles Introduction The Boltzmann Equation Transport in Phase Space and Derivation of the Boltzmann Equation Transport Coefficients The Transport Equation Conservation of Number Density Conservation of Momentum Conservation of Energy Collision Term In The Boltzmann Equation Collision Integral Collision Integral between an Electron and a Gas Molecule Elastic Collision Term Jelas Excitation Collision Term Jex Ionization Collision Term Jion Electron Attachment Collision Term Jatt Boltzmann Equation For Electrons Spherical Harmonics and Their Properties Velocity Distribution of Electrons Velocity Distribution under Uniform Number Density: g0 Velocity Distribution Proportional to rn(r, t): g1 Electron Transport Parameters References General Properties of Charged Particle Transport in Gases Introduction Electron Transport In DC Electric Fields Electron Drift Velocity Diffusion Coefficients Mean Energy of Electrons Excitation, Ionization, and Electron Attachment Rates Electron Transport in Radio Frequency Electric Fields Relaxation Time Constants Effective Field Approximation Expansion Procedure Direct Numerical Procedure Time-Varying Swarm Parameters Ion Transport In Dc Electric Fields References Modeling of Nonequilibrium (Low Temperature) Plasmas Introduction Continuum Models Governing Equations of a Continuum Model Local Field Approximation (LFA) Quasi-Thermal Equilibrium (QTE) Model Relaxation Continuum (RCT) Model Phase Space Kinetic Model Particle Models Monte Carlo Simulations (MCSs) Particle-in-Cell (PIC) and Particle-in-Cell/Monte Carlo Simulation (PIC/MCS) Models Hybrid Models Circuit Model Equivalent Circuit Model in CCP Equivalent Circuit Model in ICP Transmission-Line Model (TLM) Electromagnetic Fields and Maxwell's Equations Coulomb's Law, Gauss's Law, and Poisson's Equation Faraday's Law Ampere's Law Maxwell's Equations References Numerical Procedure of Modeling Time Constant of the System Collision-Oriented Relaxation Time Plasma Species-Oriented Time Constant Plasma-Oriented Time Constant/Dielectric Relaxation Time Numerical Techniques To Solve The Time Dependent Drift Diffusion Equation Time-Evolution Method Finite Difference Digitalization and Stabilization Time Discretization and Accuracy Scharfetter-Gummel Method Cubic Interpolated Pseudoparticle Method Semi-Implicit Method for Solving Poisson's Equation Boundary Conditions Ideal Boundary - Without Surface Interactions Dirichlet Condition Neumann Condition Periodicity Condition Electrode Surface Metallic Electrode Dielectric Electrode Boundary Conditions with Charge Exchange Boundary Conditions with Mass Transport Plasma Etching Plasma Deposition Plasma Sputtering Moving Boundary under Processing References Capacitively Coupled Plasma Radio Frequency Capacitive Coupling Mechanism of Plasma Maintenance Low-Frequency Plasma High-Frequency Plasma Electronegative Plasma Very High-Frequency Plasma Two-Frequency Plasma Pulsed Two-Frequency Plasma References Inductively Coupled Plasma Radio Frequency Inductive Coupling Mechanism of Plasma Maintenance E-mode and H-mode Mechanism of Plasma Maintenance Effect of Metastables Function of ICP Phase Transition Between E-Mode and H-Mode in an ICP Wave Propagation in Plasmas Plasma and Skin Depth ICP and the Skin Depth References Magnetically Enhanced Plasma Direct Current Magnetron Plasma Unbalanced Magnetron Plasma Radio Frequency Magnetron Plasma Magnetic Confinements Of Plasmas Magnetically Resonant Plasmas References Plasma Processing and Related Topics Introduction Physical Sputtering Target Erosion Sputtered Particle Transport Plasma Chemical Vapor Deposition Plasma CVD Large-Area Deposition with High Rate Plasma Etching Wafer Bias On Electrically Isolated Wafers (without Radio-Frequency Bias) On Wafers with Radio-Frequency Bias Selection of Feed Gas Si or Poly-Si Etching Al Etching SiO2 Etching Feature Profile Evolution Plasma Bosch Process Charging Damage Surface Continuity and Conductivity Charging Damage to Lower Thin Elements in ULSI Thermal Damage Specific Fabrication of MOS Transistor Gate Etching Contact Hole Etching Low-K Etching MEMS Fabrication References Atmospheric Pressure, Low Temperature Plasma High Pressure, Low Temperature Plasma Fundamental Process Historical Development Micro Plasma Radiofrequency Atmospheric Micro-Plasma Source Gas Heating in a Plasma Effect of Local Gas Heating References Index

Szczegóły: Plasma Electronics - Zoran Lj. Petrovic, Toshiaki Makabe

Tytuł: Plasma Electronics
Autor: Zoran Lj. Petrovic, Toshiaki Makabe
Producent: Apple
ISBN: 9781482222050
Rok produkcji: 2014
Ilość stron: 412
Oprawa: Twarda
Waga: 0.72 kg

Recenzje: Plasma Electronics - Zoran Lj. Petrovic, Toshiaki Makabe